2008 International Workshop on EUV Lithography

We are accepting post-deadline poster papers for the 2008 International Workshop on EUV Lithography to be held from June 10-12, 2008, at the Wailea Beach Marriott, Maui, Hawaii, USA. This workshop is unique in its scope as it will focus on R & D topics and will provide a forum for discussions and technical education via technology review papers and the lithography education series. Participants will gain an overview of EUVL technology and brainstorm innovative solutions to address current technical challenges. This workshop is expected to help participants make realistic technology roadmap and to provide information for making technology decisions. The workshop's geographic location is easily accessible from the US and Asia with direct flights from most major cities. A large attendance from universities, national labs and research institutions is expected. The current workshop agenda includes fifty two oral and poster papers and three panel discussions.

EUVL-related topics covered under this workshop are source, exposure tools, mask, optics, resist, contamination, metrology, patterning and cost of ownership. Technology review papers and papers with innovative approaches to address current EUVL-related technical challenges are encouraged.

The 2008 International Workshop on EUVL is organized by EUV Litho, Inc. and SPIE is the co-operating organization. The EUVL Workshop proceedings are planned to be published by SPIE on SPIE TV.

June 9: EUV Lithography by Vivek Bakshi et al.

June 10: EUV Physics by David Attwood

June 10: Fundamental Science of LER by Chris Mack