We are inviting presentations and poster papers for the 2014 International Workshop on EUV Lithography to be held from June 23-27, 2014 in Makena Beach Golf Resort, Maui, Hawaii, USA. This workshop, now in its seventh year, is focused on fundamental science of EUV Lithography (EUVL). Smaller group setting suitablefor networking and brainstorming, with a focus on fundamentals, sets this conference apart from other larger conferences focused on commercial aspects of EUVL.
The keynote speakers for 2014 EUVL Workshop are:
EUVL Short Course Information (June 23, 2014)
Last date for submission of abstracts has been extended to: March 14, 2014.
Submit abstracts to firstname.lastname@example.org
On line hotel room reservation can be at the Makena Resort's website. Please use code 'euv' to get workshop rate. For help please contact Donna at email@example.com.
Additional Logistics Information available on 2014 EUVL Workshop Page
If you need Travel VISA in order to travel to USA to attend the workshop, please contact us at firstname.lastname@example.org for an official invitation letter.
2013 Source workshop was successfully organized from Nov. 3-7, in Dublin Ireland. The workshop proceedings are now available for download at the link below.