EUV Litho, Inc.

A keynote talk was given by Akira Endo of Waseda University and the HiLASE project. He focused on identifying technology areas that need immediate development to enable current sources of 100 to 250 W. These areas include droplet generation at 150 kHz via electrostatic acceleration; 500 W solid state lasers with picosecond pulses and mJ energy for pre- pulse; and the ability to focus on 10 micron droplets. He also outlined a roadmap for 1000 W source at 13.5 nm and 6.x nm



Home Upcoming Events EUVL Workshops Source Workshops Lithography Education Series Short Course Registration Workshop Registration Sponsorship Information EUVL Technical Reports About us		FINAL AGENDA 2013 International Workshop on EUVL June 10-14, 2013, Maui Hawaii We are happy to announce the final agenda for 2013 EUVL Workshop. The abstract book and agenda can be downloaded at links below. We are still accepting late poster papers until May 30, 2013. 2013 EUVL Workshop Final Agenda 2013 EUVL Workshop Abstacts Last date for on-line workshop registration: May 10, 2013 Last day for hotel room reservation: May 13, 2013 Keynote Speakers Keynote speakers for 2013 EUVL Workshop are Sam Sivakumar (Intel Corporation) and Tatuhiko Higashiki (Toshiba). List of Technical Challenges for 2013 EUVL Workshop This year based on the feedback of technical steering committee, we have created a list of leading technical challenges for 2013 EUVL Workshop. We encourage authors to review this list and choose topics for their paper from this list. Download list of technical challenges for 2013 EUVL Workshop. Instructions for Submissions and Deadlines Please submit abstracts of less than 200 words. Please include full name, email, and mailing address for all authors. Abstracts should be submitted via email to abstracts@euvlitho.com The deadline for late poster paper submission is May 30, 2013. Abstracts will be evaluated by the workshop's technical Steering Committee for inclusion in the workshop. Authors will be notified as soon as possible, if their abstracts have been accepted for a poster paper. On-line Workshop Sponsorship On-line Registration On-line Hotel Room Reservation Page (Please call Makena Beach and Golf Resort hotel at 808-874-1111 and request the EUVL Workshop rate if on-line reservation shows that rooms are unavailable. You can also email Donna at euvlithoplanner@yahoo.com and she will help you with room reservation at workshop rates.) 2013 EUVL Workshop Information Page EUVL Short Course (June 10, 2014) Travel Cost Saving Tips Contact Information For meeting-related issues please contact: meeting.planner@euvlitho.com For technical questions, please contact: vivek.bakshi@euvlitho.com Download First Call for Papers ________________________________________________________ 2012 International Workshop on EUV and Soft X-ray Sources October 8-11, 2012, Dublin, Ireland The 2012 Source Workshop was held Oct. 8-11 in Dublin, Ireland, in the Clinton Auditorium on the campus of University College Dublin. This is the industry's largest annual gathering of EUV and soft X-ray source experts, who took the opportunity to discuss the latest results from their labs. A keynote talk was given by Akira Endo of Waseda University and the HiLASE project. He focused on identifying technology areas that need immediate development to enable current sources of 100 to 250 W. These areas include droplet generation at 150 kHz via electrostatic acceleration; 500 W solid state lasers with picosecond pulses and mJ energy for pre- pulse; and the ability to focus on 10 micron droplets. He also outlined a roadmap for 1000 W source at 13.5 nm and 6.x nm Continue reading workshop summary at EUVLFocus Blog. Download 2012 Source Workshop Proceedings (Please open in Firefox brower, if issues with Internet Explorer.) Download 2012 Source Workshop Agenda (Updated) Download 2012 Source Workshop Abstracts (Updated) Download 2011 Source Workshop Summary Download 2011 Source Workshop Proceedings Download 2010 Source Workshop Proceedings EUV and Soft X-Ray Source Workshop is organized by Source Technical Working Group (TWG).