EUV Litho, Inc.

We are excited to announce the final agenda for 2009 International Workshop on EUV Lithography. The agenda can be downloaded at the link below:

Agenda: 2009 International Workshop on EUV Lithography

We are still accepting abstracts for post-deadline poster papers for the workshop. Please visit Abstract Submission page for instructions. EUV Lithography related topics covered under this workshop are source, exposure tools, mask, optics, resist, contamination, metrology, patterning and cost of ownership. Technology review papers and papers with innovative approaches to address current EUV Lithography related technical challenges are encouraged.

The keynote talks in 2009 workshop will be presented by Intel and Samsung. The regular workshop session topics include: EUV Source, EUV Optics. Metrology, Contamination, EUV Mask and EUV Resist. In addition, there will be panel discussion on EUVL R&D status and Actinic Defect Inspection Technology for EUVL masks. The EUVL Workshop's focus is on R & D topics and the workshop will provide a forum for discussion of current EUV Lithography technical challenges. Workshop's lithography education program will provide participants with technical background and education in the area of EUVL. Workshop participants can expect to gain understanding of critical EUVL challenges and brainstorm innovative solutions.

2009 International Workshop on EUV Lithography
July 13-17, 2009, Sheraton Waikiki, Oahu, Hawaii, USA

Home Abstract Submission 2008 Workshop Conference Registration Lithography Education Series Hotel Information Oahu Information Sponsorship Information Steering Committee EUVL Technical Reports Contact us		2009 EUVL WORKSHOP AGENDA We are excited to announce the final agenda for 2009 International Workshop on EUV Lithography. The agenda can be downloaded at the link below: Agenda: 2009 International Workshop on EUV Lithography We are still accepting abstracts for post-deadline poster papers for the workshop. Please visit Abstract Submission page for instructions. EUV Lithography related topics covered under this workshop are source, exposure tools, mask, optics, resist, contamination, metrology, patterning and cost of ownership. Technology review papers and papers with innovative approaches to address current EUV Lithography related technical challenges are encouraged. The keynote talks in 2009 workshop will be presented by Intel and Samsung. The regular workshop session topics include: EUV Source, EUV Optics. Metrology, Contamination, EUV Mask and EUV Resist. In addition, there will be panel discussion on EUVL R&D status and Actinic Defect Inspection Technology for EUVL masks. The EUVL Workshop's focus is on R & D topics and the workshop will provide a forum for discussion of current EUV Lithography technical challenges. Workshop's lithography education program will provide participants with technical background and education in the area of EUVL. Workshop participants can expect to gain understanding of critical EUVL challenges and brainstorm innovative solutions. On July 13-14, lithography education classes will be offered. The workshop will start with registration and a reception on July 14 and will be followed by presentations, panel discussions and poster session on July 15 and 16. The workshop will conclude with a steering committee meeting on July 17th, which is also open to workshop attendees. The 2009 International Workshop on EUV Lithography is organized by EUV Litho, Inc. Instructions for Submissions of Post Deadline Poster Papers Please submit abstracts of less than 200 words via email to euvlworkshop@euvlitho.com. Contact Information For meeting-related issues please contact: info@euvlitho.com For technical questions, please contact: vivek.bakshi@euvlitho.com ******
		Successful EUVL R&D Forum The 2008 International Workshop on EUV Lithography was held June 10-12, 2008 at the Wailea Beach Marriott in Maui, Hawaii. The EUVL Workshop successfully achieved its goal of being a R&D forum for EUVL to help address technical challenges to bring EUVL into high-volume semiconductor manufacturing. Researchers from North American, Europe and Asia attended the workshop and presented their research in the area of EUV sources, mask, optics, contamination and resists. Panel discussions were held int he area of EUV sources, mask defects and the role of universities and national labs in the EUVL R&D. Also included in the workshop were technical review papers and the workshop was preceded by EUVL education classes. The workshop agenda and abstracts of papers are available on the 2008 EUVL Workshop. SPIE has published the proceedings along with an audio recording of the workshop and have them made available to public at http://spie.org/x27654.xml. For more highlights on the 2008 International Workshop, download the press release here.

		Workshop Organized by:

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