The 2016 Source Workshop was successfully held from November 7-9, 2016 at ARCNL, Amsterdam, The Netherlands. The workshop proceedings will be published by December 15, 2016 on this website.
2016 Source Workshop was co-organized by EUV Litho, Inc. and ARCNL.
2016 EUVL Workshop was successfully held from June 13-16, 2016. The workshop proceedings can be downloaded at the link below. Thank you for your participation and interest in the EUVL Workshop.
Igor Fomenkov (ASML)
Keynote presentation title: EUVL Exposure Tools for HVM - Status and Outlook
Harry Levinson (GlobalFoundries)
Keynote presentation title: EUV Lithography: Present and Future
Britt Turkot (Intel)
Keynote presentation title: EUVL Readiness for High Volume Manufacturing
The 2016 International Workshop on EUV Lithography (2016 EUVL Workshop) is co-organized by EUV Litho, Inc. and The Center for X-ray Optics (CXRO) at Lawrence Berkeley National Laboratory, Berkeley, CA.