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Promoting EUV Lithography

via Workshop, Consulting & Education 

 

   

 

   

2012 EUVL Workshop Final Agenda

We are happy to announce the final agenda for the 2012 International Workshop on EUV Lithography. The agenda and abstracts can be downloaded at the link below: 

Agenda: 2012 International Workshop on EUV Lithography
 
Abstracts: 2012 International Workshop on EUV Lithography

Workshop Registration Deadline: May 10, 2012

Room Reservation Deadline: May 11, 2012

We are still accepting abstracts for post-deadline poster papers for the workshop. Please visit Abstract Submission page for instructions. EUV Lithography related topics covered under this workshop are source, exposure tools, mask, optics, resist, contamination, metrology, patterning and cost of ownership. Technology review papers and papers with innovative approaches to address current EUV Lithography related technical challenges are encouraged. 
 
The keynote talks in 2012 workshop will be presented by Yan Borodovsky (Fellow and Director of Lithography, Intel Corporation) and Soichi Inoue (General Manager, EIDEC). The regular workshop session topics include: EUV Sources, BEUV, EUV Optics, Optics Contamination, EUV Mask and Patterning. In addition, there will be panel discussion on the topic of EUVL Insertion in HVM and Extension. The EUVL Workshop's focus is on R & D topics and the workshop will provide a forum for discussion of current EUV Lithography technical challenges. Workshop's EUV lithography short course program will provide participants with technical background and education in the area of EUVL. Workshop participants can expect to gain understanding of critical EUVL challenges and brainstorm innovative solutions.
 
On June 4, 2012, EUV Lithography education short course will be offered. The workshop will start with registration and a reception on June 5th and will be followed by presentations, panel discussions and poster session on June 6th and 7th. The workshop will conclude with a steering committee meeting on June 8th, which is also open to workshop attendees. 

EUVL Short Course (June 4, 2012)
Short course information

Instructions for Submissions and Deadlines (Post-deadline Poster Papers)

Please submit abstracts of less than 200 words. Please include full name, email address, mailing address for all authors and brief biography and photograph for the presenting author, for inclusion in the abstract book. Submit abstracts via email to abstracts@euvlitho.com. The deadline for abstract submission is May 10th, 2012. Abstracts will be evaluated by the workshop's technical steering committee for inclusion in the workshop. Authors will be notified as soon as possible, if their abstracts have been accepted for a poster paper.

Contact Information

For meeting-related issues please contact: meeting.planner@euvlitho.com. For technical questions, please contact: vivek.bakshi@euvlitho.com. Please visit www.euvlitho.com for additional information.

Download 2012 EUVL Workshop Flyer

On-line registration for EUVL Workshop

On-line registration for EUVL Short Course

On-Line Hotel Room Reservation at EUVL Workshop Rate

Sheraton Maui Information

Sheraton Maui Transporatation Information 

Maui Tourist Information

Please visit 2012 EUVL Workshop Home page for additional information.

Sponsorship Information

Sponsorship opportunities are available for the 2012 International Workshop on EUVL. Join global R&D leaders in supporting the industry's premiere R&D workshop to be held June 4-8, 2012 at Sheratom Maui Resort, Maui, Hawaii, USA. 

Sponsorship Link 

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First Call for Papers

 

2012 International Workshop on EUV and Soft X-ray Sources

 

October 8-11, 2012, Dublin, Ireland

 

 

 

Download First Call for Papers

 

Keynote talk: "Microfocus Sources for EUV and X-ray Applications," by Prof. Alan Michette, King's College, London, UK

 

Additional Keynote speaker to be announced.

 

Download 2011 Source Workshop Summary

Download 2011 Source Workshop Proceedings

2011 Source Workshop Home Page

EUV and Soft X-Ray Source Workshop is organized by Source Technical Working Group (TWG).

Download 2010 Source Workshop Proceedings

 

 

 

 

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