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Promoting EUV Lithography via Workshop, Consulting & Education |
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2012 EUVL Workshop Final Agenda We are happy to announce the final agenda for the 2012 International Workshop on EUV Lithography. The agenda and abstracts can be downloaded at the link below: Agenda: 2012 International Workshop on EUV Lithography Workshop Registration Deadline: May 10, 2012 Room Reservation Deadline: May 11, 2012 We are still accepting abstracts for post-deadline poster papers for the workshop. Please visit Abstract Submission page for instructions. EUV Lithography related topics covered under this workshop are source, exposure tools, mask, optics, resist, contamination, metrology, patterning and cost of ownership. Technology review papers and papers with innovative approaches to address current EUV Lithography related technical challenges are encouraged. EUVL Short Course (June 4, 2012) Instructions for Submissions and Deadlines (Post-deadline Poster Papers) Contact Information Download 2012 EUVL Workshop Flyer On-line registration for EUVL Short Course On-Line Hotel Room Reservation at EUVL Workshop Rate Sheraton Maui Transporatation Information Please visit 2012 EUVL Workshop Home page for additional information. Sponsorship Information Sponsorship opportunities are available for the 2012 International Workshop on EUVL. Join global R&D leaders in supporting the industry's premiere R&D workshop to be held June 4-8, 2012 at Sheratom Maui Resort, Maui, Hawaii, USA. ______________________________ First Call for Papers
2012 International Workshop on EUV and Soft X-ray Sources
October 8-11, 2012, Dublin, Ireland
Download First Call for Papers
Keynote talk: "Microfocus Sources for EUV and X-ray Applications," by Prof. Alan Michette, King's College, London, UK
Additional Keynote speaker to be announced.
Download 2011 Source Workshop Summary Download 2011 Source Workshop Proceedings 2011 Source Workshop Home Page EUV and Soft X-Ray Source Workshop is organized by Source Technical Working Group (TWG).
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