We are inviting presentations and poster papers for the 2016 International Workshop on EUV Lithography, to be held June 13-16, 2016 at The Center for X-ray Optics (CXRO) at Lawrence Berkeley National Laboratory in Berkeley, CA. This workshop, now in its ninth year, is focused on the fundamental science of EUV Lithography (EUVL). A smaller group setting suitable for networking and brainstorming, with a focus on fundamentals, sets this conference apart from other larger conferences based on the commercial aspects of EUVL. Download First Call for Papers for submission deadlines and additional information.
The 2016 International Workshop on EUV Lithography (2016 EUVL Workshop) is co-organized by EUV Litho, Inc. and The Center for X-ray Optics (CXRO) at Lawrence Berkeley National Laboratory, Berkeley, CA.
2016 Source Workshop is co-organized by EUV Litho, Inc. and ARCNL.