2008 International Workshop on EUV Lithography

The 2008 International Workshop on EUV Lithography was held June 10-12, 2008 at the Wailea Beach Marriott in Maui, Hawaii. The EUVL Workshop successfully achieved its goal of being a R&D forum for EUVL to help address technical challenges to bring EUVL into high-volume semiconductor manufacturing. Researchers from North American, Europe and Asia attended the workshop and presented their research in the area of EUV sources, mask, optics, contamination and resists. Panel discussions were held int he area of EUV sources, mask defects and the role of universities and national labs in the EUVL R&D. Also included in the workshop were technical review papers and the workshop was preceded by EUVL education classes.

The workshop agenda and abstracts of papers are available on the 2008 EUVL Workshop. SPIE will publish the proceedings along with an audio recording of the workshop in the coming weeks. The location and dates for the 2009 International Workshop on EUV Lithography will be announced soon.

For more highlights on the 2008 International Workshop, download the press release here.

Sponsors:

JSR Corporation