Abstract submission deadline has been extented to March 20, 2015
Mark your calenders! We are inviting presentations and poster papers for the 2015 International Workshop on EUV Lithography (EUVL Workshop), to be held June 15-19, 2015 at the Makena Beach Golf Resort in Maui, Hawaii. This workshop, now in its eighth year, is focused on the fundamental science of EUV Lithography (EUVL). A smaller group setting suitable for networking and brainstorming, with a focus on fundamentals, sets this conference apart from other larger conferences based on the commercial aspects of EUVL. A short course on EUV Lithogrpahy will be offered on June 15, 2015.
The deadline for submission of abstracts has been extented to March 20, 2015.
If you need a travel visa in order to attend the workshop, please contact us as soon as possible at email@example.com and request an official invitation letter.
2014 Source Workshop Proceedings
The 2014 International Workshop for EUV and Soft X-ray Sources was successfully held from November 3-6, 2014. The workshop summary, proceedings, agenda and the abstract book can be downloaded at the links below.