We are happy to announce the publication of the final agenda and abstracts for the 2016 EUVL Workshop. The final agenda, book of abstracts and travel and hotel information is available at links below. All authors have been notified of acceptance of their papers. On-line registration and sponsorship is now available at our website at links below. The deadline for registration, without late fee is May 23, 2016. Please write to firstname.lastname@example.org if you have any questions or need further information. We look forward to your participation and a successful workshop. Download Call for Papers for the instructions for post-deadline poster paper abstract submission and additional information.
Igor Foemnkov (ASML)
Keynote presentation title: EUVL Exposure Tools for HVM - Status and Outlook
Harry Levinson (GlobalFoundries)
Keynote presentation title: EUV Lithography: Present and Future
Britt Turkot (Intel)
Keynote presentation title: EUVL Readiness for High Volume Manufacturing
The 2016 International Workshop on EUV Lithography (2016 EUVL Workshop) is co-organized by EUV Litho, Inc. and The Center for X-ray Optics (CXRO) at Lawrence Berkeley National Laboratory, Berkeley, CA.
2016 Source Workshop is co-organized by EUV Litho, Inc. and ARCNL.