2016 Source Workshop is co-organized by EUV Litho, Inc. and ARCNL.
2016 EUVL Workshop was successfully held from June 13-16, 2016. We expect to publish the workshop proceedings by July 15, 2016 on this website. Thank you for your participation and interest in the EUVL Workshop.
Igor Foemnkov (ASML)
Keynote presentation title: EUVL Exposure Tools for HVM - Status and Outlook
Harry Levinson (GlobalFoundries)
Keynote presentation title: EUV Lithography: Present and Future
Britt Turkot (Intel)
Keynote presentation title: EUVL Readiness for High Volume Manufacturing
The 2016 International Workshop on EUV Lithography (2016 EUVL Workshop) is co-organized by EUV Litho, Inc. and The Center for X-ray Optics (CXRO) at Lawrence Berkeley National Laboratory, Berkeley, CA.